Products 
DM3 XL
Speed matters in inspection, process control, or defect and failure analysis for the microelectronics and semiconductor industry. The faster you detect a defect, the faster you can react.

30% more field of view

With a large field of view, the DM3 XL inspection system allows your team to identify defects faster and increase your yield rate. Make use of the 30% increased field of view of the unique macro objective.
  • Introduction
  • Optical high performer
  • Variety of samples – variable stage inserts
  • Work comfortably and intuitively
Seeing more means working faster. To rapidly scan large components up to 6’’, the DM3 XL provides a unique macro objective.

With a magnification of 0.7x it captures a field of view of 35.7 mm at once – 30% more than with other conventional scanning objectives.
With the DM3 XL, you can benefit from optical excellence at an affordable price.

1. Examine sides, edges or chippings with oblique illumination: illuminate your sample from different angles as an easy and effective way to visualize topographies.

2. Detect micro scratches or small particles in lower layers of the sample with in-depth darkfield contrast.
No matter what sample size and sample type you would like to inspect, you can choose from a variety of stage inserts:

1. Stage size: 150 mm x 150 mm

2. Stage inserts: Metal inserts, wafer holders or mask holders

3. Quick coarse or fine stage positioning
Simplifying the basic setting of resolution, contrast, and depth of field, the Color Coded Diaphragm Assistant (CCDA) helps to speed up your work and minimize operational errors.

Straightforward and intuitive functionality allows your team to deliver optimal results faster.

Leave your hands on the microscope and your eyes on the sample while switching contrast or illumination thanks to easily reachable controls

Easily handle the light intensity controller with the right hand

Adjust the microscope to different body heights with variable ErgoTubes and focus knobs